新闻

客户可以在我们的网页 注册 ,定期收取最新消息包括全新产品发布、应用文章及更多其它资讯。如果你错过了已发布的资料,你可浏览以下的文档。

Practical Layout Techniques to Fully Extract the Benefits of eGaN FETs

分类: 技术文章
Practical Layout Techniques to Fully Extract the Benefits of eGaN FETs

The trend for electronics is to continually push towards miniaturization while increasing performance. With silicon MOSFET technology fast approaching its theoretical limit, enhancement mode gallium nitride (eGaN®) FETs from EPC have emerged to offer a step change improvement in power FET switching performance, enabling next generation power density possibilities by decreasing size and boosting efficiency. This article will explore the recommended layout techniques required to fully extract the benefits of EPC’s eGaN FETs.

By: Ivan Chan & David Reusch, Ph.D.
EEWeb –Modern Printed Circuits
August, 2015
Read Article