GaN技术杂谈

近年来，氮化镓（GaN）功率器件的进步显著拓展了其在40 V以下低电压应用中的工作范围。由于硅MOSFET具有良好的导通性能、成熟的制造工艺以及经过验证的可靠性，历史上一直主导这一电压区间。

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氮化镓(GaN)是一种全新的使能技术，可实现更高的效率、显着减小系统尺寸、更轻和于应用中取得硅器件无法实现的性能。那么，为什么关于氮化镓半导体仍然有如此多的误解？事实又是怎样的呢？

本文最初由Dr. John Glaser & Dr. David Reusch于2016年6月13日在Power Systems Design网站上发布。

增强型氮化镓电力设备（eGaN® FETs 和 ICs）为用户提供了差异化其最终产品的途径。这项新技术在我们常用的电源和电路中提供了显著更高的效率，推动了我们的设备和电子设备的发展。

Gallium nitride (GaN) power transistors designed for efficient power conversion have been in production for seven years. New markets, such as light detection and ranging, envelope tracking, and wireless charging, have emerged due to the superior switching speed of GaN. These markets have enabled GaN products to achieve significant volumes, low production costs, and an enviable reliability reputation. All of this provides adequate incentive for the more conservative design engineers in applications such as dc–dc converters, ac–dc converters, and automotive to start their evaluation process. So what are the remaining barriers to the conversion of the US$12 billion silicon power metal–oxide–semiconductor field-effect transistor (MOSFET) market? In a word: confidence. Design engineers, manufacturing engineers, purchasing managers, and senior management all need to be confident that GaN will provide benefits that more than offset the risk of adopting a new technology. Let’s look at three key risk factors: supply chain risk, cost risk, and reliability risk.